Ion Implantation in Semiconductors 1976 - 3 Angebote vergleichen
Bester Preis: € 8,56 (vom 17.12.2016)1
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Ion Implantation in Semiconductors 1976 (1977)
EN HC USISBN: 9780306362569 bzw. 0306362562, in Englisch, Plenum Press, gebundenes Buch, gebraucht.
Lieferung aus: Vereinigte Staaten von Amerika, Versandkosten nach: USA.
Von Händler/Antiquariat, A Squared Books.
Plenum Press. Hardcover. New York & London, 1977; ISBN: 0306362562; blue cloth boards in white and red dust jacket; tears to edges of jacket; markings on free front endpaper, otherwise interior is clean; 754 pages; 4to - over 9 3/4" - 12" Tall; Additional shipping charges may be requested for International or expedited orders. . Very Good. 1977.
Von Händler/Antiquariat, A Squared Books.
Plenum Press. Hardcover. New York & London, 1977; ISBN: 0306362562; blue cloth boards in white and red dust jacket; tears to edges of jacket; markings on free front endpaper, otherwise interior is clean; 754 pages; 4to - over 9 3/4" - 12" Tall; Additional shipping charges may be requested for International or expedited orders. . Very Good. 1977.
2
Ion Implantation in Semiconductors 1976 (1977)
EN HC US FEISBN: 9780306362569 bzw. 0306362562, in Englisch, 754 Seiten, Springer, gebundenes Buch, gebraucht, Erstausgabe.
Lieferung aus: Vereinigte Staaten von Amerika, Usually ships in 1-2 business days, zzgl. Versandkosten.
Von Händler/Antiquariat, asquaredbooks.
The Fifth International Conference on Ion Implantation took place in Boulder, Colorado between the 9th and 13th of August 1976. Papers were delivered by scientists and engineers from 15 countries, and the attendees represented 19 countries. As has become the custom at these conferences, the sessions were intense with the coffee breaks and evenings given to informal meetings among the participants. It was a time to renew old friendships, begin new ones, exchange ideas, personally question authors of papers that appeared in the literature since the last conference and find out what was generally happening in Ion Implantation. In recent years it has beome more difficult to get funding to travel to such meetings. To assist the participating authors financial aid was solicited from industry and the Office of Naval Research. We are most grateful for their positive response to our requests. The success of the conference was in part due to their generous contributions. The Program Committee had the unhappy task of the reviewing of more than 170 abstracts. The result of their labors was well worth their effort. Much thanks goes to them for molding the conference into an accurate representation of activities in the field. Behind the scenes in Boulder, local arrangements were handled ably by Graeme Eldridge. The difficulty of this task cannot be overemphasized. Our thanks to him for a job well done. Hardcover, Ausgabe: 1, Label: Springer, Springer, Produktgruppe: Book, Publiziert: 1977-11-01, Studio: Springer.
Von Händler/Antiquariat, asquaredbooks.
The Fifth International Conference on Ion Implantation took place in Boulder, Colorado between the 9th and 13th of August 1976. Papers were delivered by scientists and engineers from 15 countries, and the attendees represented 19 countries. As has become the custom at these conferences, the sessions were intense with the coffee breaks and evenings given to informal meetings among the participants. It was a time to renew old friendships, begin new ones, exchange ideas, personally question authors of papers that appeared in the literature since the last conference and find out what was generally happening in Ion Implantation. In recent years it has beome more difficult to get funding to travel to such meetings. To assist the participating authors financial aid was solicited from industry and the Office of Naval Research. We are most grateful for their positive response to our requests. The success of the conference was in part due to their generous contributions. The Program Committee had the unhappy task of the reviewing of more than 170 abstracts. The result of their labors was well worth their effort. Much thanks goes to them for molding the conference into an accurate representation of activities in the field. Behind the scenes in Boulder, local arrangements were handled ably by Graeme Eldridge. The difficulty of this task cannot be overemphasized. Our thanks to him for a job well done. Hardcover, Ausgabe: 1, Label: Springer, Springer, Produktgruppe: Book, Publiziert: 1977-11-01, Studio: Springer.
3
Symbolbild
Ion Implantation in Semiconductors 1976 (1977)
EN HC USISBN: 9780306362569 bzw. 0306362562, in Englisch, Plenum Press, gebundenes Buch, gebraucht.
Lieferung aus: Vereinigte Staaten von Amerika, zzgl. Versandkosten, Verandgebiet: DOM.
Von Händler/Antiquariat, A Squared Books, MI, South Lyon, [RE:5].
Hardcover.
Von Händler/Antiquariat, A Squared Books, MI, South Lyon, [RE:5].
Hardcover.
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