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100%: Michael A. Lieberman (Univ. of California, Berkeley ); Alan J. Lichtenberg (Univ. of California, Ber: Principles Plasma Discharges and Materials Processing , 2nd Edition (ISBN: 9780471720010) 2005, in Englisch, Broschiert.Nur diese Ausgabe anzeigen…
47%: Lieberman, Michael A., Allan J. Lichtenberg and M. A. Lieberman: Principles of Plasma Discharges Materials Processing (ISBN: 9780471005773) in Englisch, Broschiert.Nur diese Ausgabe anzeigen…
Principles Plasma Discharges and Materials Processing , 2nd Edition
14 Angebote vergleichen
| Preise | 2013 | 2014 | 2015 | 2017 | 2021 |
|---|---|---|---|---|---|
| Schnitt | € 119,58 | € 109,12 | € 126,54 | € 170,95 | € 195,50 |
| Nachfrage |
1
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Principles of Plasma Discharges and Materials Processing
EN HC NWISBN: 9780471005773 bzw. 0471005770, in Englisch, Wiley-Interscience, gebundenes Buch, neu.
Lieferung aus: Vereinigte Staaten von Amerika, Versandkosten nach: USA.
Von Händler/Antiquariat, Lyric Vibes.
Wiley-Interscience. Hardcover. 0471005770 New Condition *** Right Off the Shelf | Ships within 2 Business Days ~~~ Customer Service Is Our Top Priority! - Thank you for LOOKING :-) . New.
Von Händler/Antiquariat, Lyric Vibes.
Wiley-Interscience. Hardcover. 0471005770 New Condition *** Right Off the Shelf | Ships within 2 Business Days ~~~ Customer Service Is Our Top Priority! - Thank you for LOOKING :-) . New.
2
Principles of Plasma Discharges and Materials Processing (2005)
EN HC NWISBN: 9780471720010 bzw. 0471720011, in Englisch, John Wiley & Sons, gebundenes Buch, neu.
Lieferung aus: Schweiz, Versandfertig innert 3 Wochen.
This Second Edition of Principles of Plasma Discharges and Materials Processing is a thorough revision and updating of the very well received first edition of this text. According to the reviewer: ´´The first edition was first and foremost a remarkably complete reference book, both for basic plasma physics and for industrial plasma processing. It was the bible for students and workers in the latter field.´´, A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever. gebundene Ausgabe, 13.05.2005.
This Second Edition of Principles of Plasma Discharges and Materials Processing is a thorough revision and updating of the very well received first edition of this text. According to the reviewer: ´´The first edition was first and foremost a remarkably complete reference book, both for basic plasma physics and for industrial plasma processing. It was the bible for students and workers in the latter field.´´, A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever. gebundene Ausgabe, 13.05.2005.
3
Principles Of Plasma Discharges And Materials Processing
~EN NWISBN: 9780471720010 bzw. 0471720011, vermutlich in Englisch, 2. Ausgabe, Wiley, Vereinigte Staaten von Amerika, neu.
Lieferung aus: Niederlande, zzgl. Versandkosten.
This is a thorough update of the industry classic on principles of plasma processing. The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.
This is a thorough update of the industry classic on principles of plasma processing. The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.
4
Principles of Plasma Discharges and Materials Processing (2005)
~EN NW FEISBN: 9780471720010 bzw. 0471720011, vermutlich in Englisch, John Wiley & Sons, Inc. neu, Erstausgabe.
Lieferung aus: Schweiz, Versandfertig innert 6 - 9 Werktagen.
A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever. gebundene Ausgabe, 01.04.2005.
A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever. gebundene Ausgabe, 01.04.2005.
5
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Principles of Plasma Discharges and Materials Processing , 2nd Edition
EN HC USISBN: 9780471720010 bzw. 0471720011, in Englisch, Wiley-Interscience, gebundenes Buch, gebraucht.
Lieferung aus: Vereinigte Staaten von Amerika, Shipping costs to: USA.
Von Händler/Antiquariat, Books Express.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Von Händler/Antiquariat, Books Express.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
6
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Principles of Plasma Discharges and Materials Processing (1994)
EN HC USISBN: 9780471005773 bzw. 0471005770, in Englisch, Wiley-Interscience, gebundenes Buch, gebraucht.
Lieferung aus: Vereinigte Staaten von Amerika, Versandkosten nach: USA.
Von Händler/Antiquariat, Ergodebooks.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Von Händler/Antiquariat, Ergodebooks.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
7
Principles of Plasma Discharges and Materials Processing
EN NW FEISBN: 9780471720010 bzw. 0471720011, in Englisch, Wiley-Blackwell, neu, Erstausgabe.
Lieferung aus: Vereinigtes Königreich Großbritannien und Nordirland, 3-5 Days.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
8
Principles of Plasma Discharges Materials Processing. (1994)
EN HCISBN: 9780471005773 bzw. 0471005770, in Englisch, John Wiley & Sons Inc, gebundenes Buch.
Von Händler/Antiquariat, Wissenschaftl. Antiquariat Th. Haker e.K [51982769], Klettgau, Germany.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
9
Symbolbild
Principles of Plasma Discharges and Materials Processing , 2nd Edition
EN HC USISBN: 9780471720010 bzw. 0471720011, in Englisch, Wiley-Interscience, gebundenes Buch, gebraucht.
Lieferung aus: Vereinigte Staaten von Amerika, Shipping costs to: USA.
Von Händler/Antiquariat, Cloud 9 Books.
Wiley-Interscience. Hardcover. 0471720011 Like New Condition. . Fine.
Von Händler/Antiquariat, Cloud 9 Books.
Wiley-Interscience. Hardcover. 0471720011 Like New Condition. . Fine.
10
Principles of Plasma Discharges and Materials Processing , 2nd Edition
EN USISBN: 0471720011 bzw. 9780471720010, in Englisch, Wiley-Interscience, gebraucht.
Lieferung aus: Vereinigte Staaten von Amerika, In Stock.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
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