Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
3 Angebote vergleichen
Bester Preis: € 46,97 (vom 11.04.2017)1
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
US
ISBN: 9784431547945 bzw. 4431547940, Sprache unbekannt, Springer Verlag, SPRIV, SPRIV, gebraucht.
Lieferung aus: Vereinigte Staaten von Amerika, プラス送料, in-stock.
This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.
This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.
2
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
NW
ISBN: 9784431547945 bzw. 4431547940, Sprache unbekannt, Springer Japan, neu.
Lieferung aus: Kanada, 入荷, プラス送料.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
3
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
PB NW
ISBN: 9784431547945 bzw. 4431547940, Sprache unbekannt, Springer Japan, Taschenbuch, neu.
Lieferung aus: Vereinigte Staaten von Amerika, 入荷, プラス送料.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
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